Thermal chemistry of the Cu-KI5 atomic layer deposition precursor on a copper surface

Surface Chemistry of Copper(I) Acetamidinates in Connection with Atomic Layer Deposition (ALD) Processes

Given the high stability of amidines, they have long been considered good choices as bidentate ligands in organometallic compounds. Early uses of metal amidinates have been reported in catalysis to promote polymerizations and other related reactions. 3 More recently, metal amidinates have been developed as promising precursors for the deposition of solid thin films. 8 They have proven particula...

Atomic Layer Deposition of Ultrathin Copper Metal Films from a Liquid Copper(I) Amidinate Precursor

We report a method for producing thin, completely continuous and highly conductive copper films conformally inside very narrow holes with aspect ratios over 35:1 by atomic layer deposition ALD . Pure copper thin films were grown from a novel copper I amidinate precursor, copper I N,N -di-sec-butylacetamidinate, and molecular hydrogen gas as the reducing agent. This copper precursor is a liquid ...

Area selective atomic layer deposition of titanium dioxide: Effect of precursor chemistry

Surface and interface processes during atomic layer deposition of copper on silicon oxide.

The initial surface chemistry and growth mechanisms of the atomic layer deposition (ALD) of metallic copper on SiO(2) surfaces are investigated using an amidinate precursor (copper(I) di-sec-butylacetamidinate, [Cu((s)Bu-amd)](2)) and molecular hydrogen. Using in situ Fourier transform infrared spectroscopy together with calculations based on density functional theory, we show that the initial ...

Surface chemistry and film growth during TiN atomic layer deposition 4 using TDMAT and NH 3

22 Abstract 23 24 Surface chemistry and film growth were examined during titanium nitride (TiN) atomic layer deposition (ALD) using sequential 25 exposures of tetrakis-dimethylamino titanium (TDMAT) and NH . This ALD system is shown to be far from ideal and illustrates 3 26 many potential problems that may affect ALD processing. These studies were performed using in situ Fourier transform infra...